Development, production and distribution of resists for optical and electron beam lithography as well as process chemicals

Allresist GmbH

Am Biotop 14, 15344 StrausbergNew on Amplifa

1992Founded

StrausbergLocation of headquarters and production

About Allresist

Allresist GmbH develops, produces and distributes resists for optical and electron beam lithography as well as the corresponding process chemicals for the manufacture of electronic components. Its unique selling point is custom resist development tailored to customer requirements: with its own research and development department, cost-effective, technology-adapted resists are created in a short time. The portfolio includes, among other things, PMMA e-beam resists, the E-Beam Resist AR-N 7520, the resist AR-P 3110, the Medusa 84 SiH system, HSQ as well as PPA for bilayer and lift-off applications. In 2026, the company introduced the TMAH-free, choline hydroxide-based developers AR 300-41 and AR 300-42. The products are used primarily in microelectronics, the semiconductor and sensor industries, and at research and academic institutions. The company has been based in Strausberg (Brandenburg) since its founding in 1992, and in September 2026 celebrated the topping-out ceremony for a new logistics center, implemented as an investment of around €3 million.

Site: Strausberg
Processes: Development, production and distribution of resists for optical lithography, Development, production and distribution of resists for electron beam lithography, Production of process chemicals for the manufacture of electronic components (developers), Custom resist development according to customer requirements (customized solutions), Custom resist development, Development, production and distribution of resists for optical and electron beam lithography, Process chemicals, Research and development
Materials: Choline hydroxide developer AR 300-41 (45 %), Choline hydroxide developer AR 300-42 (4.3 %), PMMA e-beam resist, E-Beam Resist AR-N 7520, Resist AR-P 3110, Medusa 84 SiH system, HSQ (hydrogen silsesquioxane), PPA (polyphthalaldehyde) for bilayer applications
Founded: 1992
Industries: Microelectronics, Semiconductors, Sensor technology, Optical lithography, Electron beam lithography, Research/Academia

01
Custom resist development
02
Research and development
03
Production
04
Distribution
05
Logistics

Resists and Process Chemicals

AR 300-41

Choline Hydroxide Developer AR 300-41 (45 %)

TMAH-free developer for various photoresist and HSQ processes.

AR 300-42

Choline Hydroxide Developer AR 300-42 (4.3 %)

Diluted variant of the TMAH-free choline developer.

PMMA

PMMA e-beam resists

E-beam resists for electron beam lithography.

AR-N 7520

E-Beam Resist AR-N 7520

Flexible E-beam resist for research applications.

AR-P 3110

Resist AR-P 3110

Resist for lithography applications, including use at universities.

Medusa 84

Medusa 84 SiH System

Sustainable system, finalist at the German Sustainability Award for Products 2027.

HSQ

Hydrogen silsesquioxane (HSQ)

Resist for lithography processes, among other things compatible with the TMAH-free choline developer.

PPA

PPA (polyphthalaldehyde)

For bilayer applications or lift-off to create undercut structures.

Locations

Strausberg

Headquarters and production; new logistics center under construction

Materials: Resists, process chemicals

Products

**Medusa 84 SiH system with choline hydroxide developer (contrast curve)**Resist development · Microelectronics

Inside the production

Trade fair booth at MNE 2026 in Interlaken (Switzerland)

Industries

MicroelectronicsSemiconductorsSensor technologyOptical lithographyElectron beam lithographyResearch/AcademiaElectronic components

Processes & technical limits

Processes	Tolerance	Max. part	Weight	Lot size	Materials
Development, production and distribution of resists for optical lithographyEngineering	–	–	–	–	Photoresists
Development, production and distribution of resists for electron beam lithographyEngineering	–	–	–	–	PMMA e-beam resists, AR-N 7520
Production of process chemicals for the manufacture of electronic components (developers)Engineering	–	–	–	–	AR 300-41 (choline hydroxide developer, 45 %), AR 300-42 (choline hydroxide developer, 4.3 %), TMAH-free developers
Custom resist development according to customer requirements (customized solutions)Engineering	–	–	–	–	HSQ, PPA (bilayer applications/lift-off), Medusa 84 SiH, AR-P 3110

Additional services

Custom resist developmentDevelopment, production and distribution of resists for optical and electron beam lithographyProcess chemicalsResearch and developmentLogistics center (new construction)

Reference customers

Centrum für intelligente Sensorik GmbHPaul-Drude-InstitutUnited Monolithic Semiconductors GmbHWestsächsische HochschuleDresdner Chipakademie

History

1992
Founding of Allresist GmbH; start of the business model of high product quality at moderate prices.
2026
Market launch of the TMAH-free choline hydroxide developers AR 300-41 and AR 300-42.
2026
Topping-out ceremony for the new logistics center in Strausberg (investment of around €3 million); finalist at the German Sustainability Award for Products 2027 with the Medusa 84 SiH system.