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Develops custom plasma systems for cleaning, coating and etching as well as high-frequency components.

AU

AURION Anlagentechnik GmbH

SeligenstadtNew on Amplifa

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SeligenstadtLocation
German/EnglishLanguages

About AURION

AURION Anlagentechnik GmbH, based in Seligenstadt, develops and manufactures specific plasma systems and plasma technology components. The portfolio includes atmospheric-pressure plasma sources (KIVOS concept), systems for atmospheric sputtering, reactive ion etching (RIE), microwave downstream plasma, PVD sputtering systems and PECVD systems, including cluster and inline solutions. In addition, the company offers high-frequency components such as automatic impedance matching networks (matchboxes), switches, filters, power splitters and phase shifters as well as RF systems for particle accelerators. Every system is developed as part of a customer-specific project cycle in close coordination with the customer. AURION also provides consulting services and training in the fields of plasma and high-frequency technology. Customers include research institutions (Big Science, particle accelerators) as well as surface and vacuum technology.

Site
Seligenstadt
Processes
Plasma cleaning, Plasma coating, Atmospheric-pressure plasma sources, Atmospheric-pressure sputtering, RIE (Reactive Ion Etching), PECVD, Microwave downstream plasma, PVD (sputtering)
Materials
Atmospheric-pressure plasma (KIVOS), Reactive Ion Etching, Microwave Downstream Plasma, PVD Sputtering, PECVD, High-frequency components
Industries
Big Science / Research (particle accelerators), Surface technology / Vacuum technology
  1. 01

    Consulting and requirements analysis

  2. 02

    Development of the custom system

  3. 03

    Manufacturing and assembly of plasma and RF components

  4. 04

    Commissioning

  5. 05

    Service and training

Processes and Technologies

AP-Plasma

Atmospheric-pressure plasma (KIVOS)

Atmospheric-pressure plasma sources and sputtering for surface pretreatment without a vacuum chamber.

RIE

Reactive Ion Etching

RIE systems for targeted etching and fine cleaning of surfaces.

MW-DS

Microwave Downstream Plasma

Downstream plasma systems for gentle treatment of even sensitive surfaces.

PVD

PVD Sputtering

Sputtering systems for applying thin films in a vacuum.

PECVD

PECVD

Plasma-enhanced chemical vapor deposition for functional coatings.

HF

High-frequency components

Impedance matching networks, switches, filters, power splitters and phase shifters for plasma and accelerator applications.

Locations

Seligenstadt

DE

Headquarters: development, manufacturing and sales

  • KIVOS atmospheric-pressure plasma system
  • RIE system
  • Microwave downstream plasma system
  • PVD sputtering system
  • PECVD system
  • Cluster and inline systems

Industries

Big Science / Research (particle accelerators)Surface technology / Vacuum technology

Processes & technical limits

ProcessesToleranceMax. partWeightLot sizeMaterials
Plasma cleaningSurface–––––
Plasma coatingSurface–––––
Atmospheric-pressure plasma sourcesSurface–––––
Atmospheric-pressure sputteringSurface–––––
RIE (Reactive Ion Etching)Surface–––––
PECVDSurface–––––
Microwave downstream plasmaSurface–––––
PVD (sputtering)Surface–––––
Low-pressure plasmaSurface–––––

6 Anlagen & Maschinen

MachineManufacturer / modelQuantityWorking areaYear builtSite
Atmospheric-pressure plasma systemAURION KIVOS–––Seligenstadt
RIE systemAURION–––Seligenstadt
Microwave downstream plasma systemAURION–––Seligenstadt
PVD sputtering systemAURION–––Seligenstadt
PECVD systemAURION–––Seligenstadt
Cluster and inline systems (plasma)AURION–––Seligenstadt

Additional services

Consulting servicesTraining
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