Manufacture of lithography optics, photomask and wafer fab solutions, and multidimensional industrial metrology
Carl Zeiss AG (Segmente Semiconductor Manufacturing Technology und Research & Quality Solutions)
Oberkochen · Wetzlar · Jena · Rossdorf · Aachen · Coswig · Zürich · Dublin · Bar Lev · Minneapolis · Shanghai · BangaloreNew on Amplifa
About ZEISS SMT and ZEISS Research & Quality Solutions
ZEISS is a technology group in the legal form of a foundation-owned company (Carl-Zeiss-Foundation) headquartered in Oberkochen. The Semiconductor Manufacturing Technology (SMT) segment develops and manufactures high-precision optics for semiconductor manufacturing, including EUV lithography optics (13.5 nm), DUV optics (365, 248, 193 nm), High-NA EUV systems, laser and mirror components, as well as photomask and wafer fab solutions such as 3D X-ray laminography (ZEISS NLX, 300-mm wafers), multibeam SEM (ZEISS MultiSEM) and FIB-SEM workstations. The Research & Quality Solutions (RQS) segment is a manufacturer of multidimensional industrial metrology: coordinate measuring machines, optical and multisensor systems, microscope systems for industrial quality inspection, 3D X-ray metrology and measurement software. ZEISS is not a contract manufacturer of components, but offers measurement services (Contract Inspection), calibration, retrofit, training and service through a global network of Quality Excellence Centers. Materials in optics manufacturing include glass, quartz, calcium fluoride (CaF2) and silicon wafers (process environment). Customer industries include semiconductor manufacturing, automotive, aerospace, medical technology, electronics, energy technology as well as mechanical engineering and robotics. Around 80% of all microchips manufactured worldwide use lithography optics from ZEISS SMT and partner ASML.
- Site
- Oberkochen
- Processes
- Metrology software and digitalization (ZEISS Quality Insights/software platform), Service and support: maintenance, repair, retrofit, calibration, ZEISS Quality Excellence Centers / measurement services (Contract Inspection), Training (ZEISS Academy Metrology, AUKOM), Software maintenance agreements (SMA), Monitor & Analysis (machine data), Accessories and aftermarket services
- Materials
- Glass, Quartz, Calcium fluoride (CaF2), Silicon wafer
- Founded
- 1846
- Employees
- 9349
- Industries
- Semiconductor Manufacturing, Automotive, Aerospace, Medical Technology, Electronics, Energy Technology
- 01
Development and design of optics and measuring systems
- 02
Precision manufacturing of optical and mechanical components (glass, quartz,
- 03
Non-destructive testing and nanometer metrology
- 04
System integration and cleanroom assembly
- 05
Qualification, delivery and commissioning
- 06
Service, calibration, retrofit and refurbishment
Materials and Processes
Glass
Substrate material for photomasks and optical components of lithography.
Quartz
Transparent mask material with nanometer-fine chip structures.
Calcium fluoride (CaF2)
Components for DUV lithography lasers at wavelengths of 193 and 248 nm.
Silicon wafer
300-mm wafers as process environment for wafer fab solutions (NLX, DUNE, MultiSEM).
Products and Systems
Inside the production
Industries
Processes & technical limits
| Processes | Tolerance | Max. part | Weight | Lot size | Materials |
|---|---|---|---|---|---|
| Metrology manufacturing (coordinate measuring machines, optical and | – | – | – | – | – |
| Measurement services (contract measurement) | – | – | – | – | – |
| Semiconductor manufacturing technology (SMO/SMS/SFS) | – | – | – | – | Glass, Quartz, Calcium fluoride (CaF2), Silicon wafer (process environment) |
6 Anlagen & Maschinen
| Machine | Manufacturer / model | Quantity | Working area | Year built | Site |
|---|---|---|---|---|---|
| ZEISS NLX – inline 3D X-ray laminography | – | – | – | – | – |
| ZEISS DUNE 100 – active wafer shape control | – | – | – | – | – |
| ZEISS MultiSEM – multibeam SEM | – | – | – | – | – |
| 3D Metrology and Inspection Workstation | – | – | – | – | – |
| Starlith® 1900i / 4200 lithography optics | – | – | – | – | – |
| AIMS® / PROVE mask systems | – | – | – | – | – |
Additional services
Reference customers
History
- 1846
Founding of ZEISS
- 1968
First ZEISS optic for a circuit projector (Telefunken), 15 µm structures
- 1977
First wafer stepper with ZEISS optics (S-Planar 10/0.28, David Mann/GCA)
- 1994
Establishment of the ZEISS SMT business division
- 1997
Strategic partnership with ASML
- 1998
First 193-nm optic
- 2001
Establishment of the SMT facilities in Oberkochen
- 2002
ASML and ZEISS SMT become world market leaders
- 2005
NaWoTec GmbH Rossdorf becomes part of ZEISS SMT (Mask Repair)
- 2008
Pixer Technology (Israel) becomes part of ZEISS SMT (Mask Tuning)
- 2016
ASML becomes a minority shareholder of ZEISS SMT
- 2017
Founding of ZEISS Process Control Solutions (today Semiconductor Fab Solutions)
- 2019
First EUV chips on the mass market (smartphones)
- 2020
German Future Prize for EUV lithography (ZEISS, TRUMPF, Fraunhofer IOF)
- 2023
First projection optic and illumination system for High-NA EUV delivered
- 2024
Acquisition of Philips Engineering Solutions (Aachen) and the lithography division of Beyond Gravity; Werner von Siemens Ring and ASML Supplier Award
- 2025
30 years of EUV lithography optics at ZEISS