CCR Technology develops and manufactures COPRA RF-ICP plasma sources for coating, etching and surface modification.
CCR GmbH
TroisdorfNew on Amplifa
About CCR Technology
CCR Technology, based in Troisdorf, is the manufacturer of COPRA® plasma technology, a filamentless, inductively coupled 13.56 MHz RF plasma source. The company manufactures plasma sources in various designs (Round, Linear, Ring, Built In) as well as plasma systems and Faraday cup systems, supplying end users, equipment manufacturers (OEMs) and research groups. Applications include PECVD of silicon, metal oxide and nitride layers for barrier and functional layers, PVD assist (sputter and e-gun assist), etching/ion milling, plasma cleaning and activation, and PALD assist. Target markets are precision optics, solar, semiconductors, displays and storage media, architectural glass coating, as well as wear and decorative coatings. Since its founding in 1995, more than 1500 units have been sold to over 40 countries. In addition to hardware, CCR provides a pool of know-how for process development.
- Site
- Troisdorf
- Processes
- PECVD (plasma enhanced chemical vapor deposition) of silicon, metal oxides and nitrides for, PVD Assist (Sputter Assist, E-Gun Assist) using 13.56 MHz RF-ICP plasma source, Etching / Chemical Etching / Ion Milling, Cleaning (plasma cleaning), Activation (plasma activation), PALD Assist (Plasma-Assisted ALD Assist), Surface modification / densification of thin layers (Ion Assist, ion energy 15–150 eV), Service/Support
- Materials
- Silicon, Metal oxides, Nitrides, DLC (Diamond-Like Carbon), Glass, Polymers, Inductively coupled 13.56 MHz RF plasma, Silicon, metal oxides, nitrides
- Certificates
- ISO 9001
- Founded
- 1995
- Industries
- Precision Optics, Solar, Semiconductor, Displays, Storage Media, Architectural Glass
- 01
Development of the RF plasma source
- 02
Engineering and manufacturing
- 03
Sales (international)
- 04
Service and support
- 05
Know-how transfer/process consulting
Materials and Applications
Inductively coupled 13.56 MHz RF plasma
Filamentless plasma excitation with high coupling efficiency (up to 90 %) and plasma density above 1E12/cm³.
Silicon, metal oxides, nitrides
Deposition of barrier and functional layers as well as optical filter stacks.
DLC (Diamond-Like Carbon)
Wear-resistant and decorative coatings on conductive and non-conductive substrates.
Glass
Substrate material for optical multilayers and low-E coatings.
Polymers
Substrate material for optical multilayer coatings.
Locations
Troisdorf
DEHeadquarters with development, sales and service
- COPRA Round Sources
- COPRA Linear Sources
- COPRA Ring Sources
- COPRA Built In Sources
- Plasma Systems
- Faraday Cup System
Products
Inside the production
Industries
Processes & technical limits
| Processes | Tolerance | Max. part | Weight | Lot size | Materials |
|---|---|---|---|---|---|
| PECVD (plasma enhanced chemical vapor deposition) of silicon, metal oxides and nitrides forSurface | – | – | – | – | Silicon, Metal oxides, Nitrides |
| PVD Assist (Sputter Assist, E-Gun Assist) using 13.56 MHz RF-ICP plasma sourceSurface | – | – | – | – | – |
| Etching / Chemical Etching / Ion MillingSurface | – | – | – | – | conductive and non-conductive substrate materials |
| Cleaning (plasma cleaning)Surface | – | – | – | – | – |
| Activation (plasma activation)Surface | – | – | – | – | – |
| PALD Assist (Plasma-Assisted ALD Assist)Surface | – | – | – | – | – |
| Surface modification / densification of thin layers (Ion Assist, ion energy 15–150 eV)Surface | – | – | – | – | conductive and non-conductive substrates |
6 Anlagen & Maschinen
| Machine | Manufacturer / model | Quantity | Working area | Year built | Site |
|---|---|---|---|---|---|
| COPRA plasma source (RF-ICP, 13.56 MHz, inductively coupled) | CCR Technology COPRA Round Sources | – | – | – | Troisdorf, Germany |
| COPRA plasma source (RF-ICP, 13.56 MHz, inductively coupled) | CCR Technology COPRA Linear Sources | – | – | – | Troisdorf, Germany |
| COPRA plasma source (RF-ICP, 13.56 MHz, inductively coupled) | CCR Technology COPRA Ring Sources | – | – | – | Troisdorf, Germany |
| COPRA plasma source (RF-ICP, 13.56 MHz, inductively coupled) | CCR Technology COPRA Built In Sources | – | – | – | Troisdorf, Germany |
| Plasma system (under construction) | CCR Technology | – | – | – | Troisdorf, Germany |
| Faraday cup system | CCR Technology | – | – | – | Troisdorf, Germany |
Additional services
Quality
The COPRA technology operates with constant base plasma parameters, so that process results are reproducible independently of scaling in size and speed.
| Evidence | Troisdorf |
|---|---|
| ISO 9001 |
History
- 1995
Founding of CCR Technology and start of the development of RF plasma technology (COPRA®)
More than 1500 units sold in over 40 countries; 25 years of activity in the field of plasma