Japanese manufacturer of synthetic precision abrasives, CMP slurries and thermal spray powders.
FUJIMI INCORPORATED
Kiyosu, Aichi (Japan) · Inazawa, Aichi (Japan) · Kakamigahara, Gifu (Japan) · Tualatin, Oregon (USA) · Kulim, Kedah (Malaysia) · Ingelfingen (Germany)New on Amplifa
About Fujimi
FUJIMI INCORPORATED was founded in 1950 and is a Japanese manufacturer of synthetic precision abrasives headquartered in Kiyosu, Aichi Prefecture. The company produces lapping and polishing materials, CMP slurries for semiconductor manufacturing, polishing agents for hard disks and optical lenses, as well as cermets and oxide ceramic powders for thermal spraying. The processes are based on three core competencies: filtration/classification/purification, powder technology and chemical technology. Materials processed include aluminum oxides, silicon carbide, tungsten carbide cermets, cerium oxide and colloidal silica for substrates made of silicon, sapphire, GaAs, GaN, SiC, LiNbO3 and LiTaO3. Customers are found in the semiconductor industry, hard disk drives, LED/lighting, optics, automotive and aerospace industries as well as in the steel and energy sectors. With production plants in Japan, the USA and Malaysia and sales companies in Europe, China, Korea and Taiwan, Fujimi supplies customers worldwide, including Intel, AMD and TSMC.
- Site
- 452-8502 Kiyosu, Aichi
- Processes
- Lapping (abrasive products FO, A, WA, PWA, GC, C), Polishing (COMPOL, POLIPLA, FM, FAL, FZ, INSEC, GLANZOX, MIRAFLEX), CMP (Chemical Mechanical Planarization, PLANERLITE slurries), Slicing/Cutting (GC abrasives for wire saws), Grinding (diamond products FDP, FDW, FDC, DIATEC), Blasting (A, WA, GC), Thermal spraying (thermal spray with cermet and ceramic powders), HVOF thermal spray system (ultrafine grain, world first 2002)
- Materials
- Silicon (single-crystal ingot, wafer), Silicon carbide (α-type, green), Aluminum oxide (white fused alumina), Calcined platelet aluminum oxide, Cubic aluminum oxide, Titanium phosphate, Zinc oxide (rod-shaped, Al-doped electrically conductive), Tungsten carbide cemented carbide powder
- Certificates
- ISO 9002, ISO 9001, ISO 14001, JIS Q 9100, JIS Q 9100 (aerospace)
- Founded
- 1950
- Employees
- 1305
- 01
Raw powder synthesis and powder design
- 02
Filtration, classification, purification
- 03
Chemical formulation (slurries, polishing compositions)
- 04
Quality control and particle characterization
- 05
Technical development from prototype stage together with customers
- 06
Sales via a global network
Materials & Processes
White Fused Alumina (>96,0 % Al2O3)
Corundum abrasive grain for lapping, polishing, blasting and grinding wheels.
Platelet Calcined Alumina (>99,0 % Al2O3)
Platelet-shaped polishing agent in a broad particle size distribution from 3.1 to 35 µm.
Green Silicon Carbide (α-type)
Very hard, chemically stable abrasive grain for slicing, lapping and as a sintering raw material.
Cerium Oxide (FR Series)
Polishing agent for optical glass and flat glass since 1960.
WC/17 % Co (AMS7881A)
Cemented carbide spray powder with high toughness and wear resistance, among other uses in aerospace.
WC/10 % Co/4 % Cr (AMS7882A)
Spray powder with high hardness as well as corrosion and cavitation erosion resistance.
WC/20 % CrC/7 % Ni
Cermet spray powder for wear, corrosion and oxidation protection.
Aluminum Oxide-Titanium Oxide
Oxide ceramic spray powder used, among other things, for electrostatic chucks and chamber walls.
Molybdenum Boride
Boride cermet spray powder for rolls in steel transport.
Colloidal Silica / Silicon Polishing Chemistry
Basis of the GLANZOX and CMP slurry products for silicon wafers.
Rod-Shaped Zinc Oxide
Thermally conductive filler for thermal interface materials, also Al-doped electrically conductive.
Diamond Abrasive Products
For stable, precise grinding of optics, cemented carbide, ferrite and barium titanate.
Products & Applications
Inside the production
Processes & technical limits
| Processes | Tolerance | Max. part | Weight | Lot size | Materials |
|---|---|---|---|---|---|
| Lapping (abrasive products FO, A, WA, PWA, GC, C)Surface | – | – | – | – | Silicon wafers, Glass, Sapphire, GaN, GaAs, GaP, InP, SiC, LiNbO3, LiTaO3, Ferrite, Barium titanate, Alumina, PZT, Metals, Plastics |
| Polishing (COMPOL, POLIPLA, FM, FAL, FZ, INSEC, GLANZOX, MIRAFLEX)Surface | Mirror finish | – | – | – | Silicon wafers, Glass, Sapphire, GaN, SiC, GaAs, GaP, InP, LiNbO3, LiTaO3, Ferrite, Barium titanate, Alumina, PZT, Metals, Plastic lenses, Automotive clear coat |
| CMP (Chemical Mechanical Planarization, PLANERLITE slurries)Surface | – | – | – | – | Silicon, Cu (copper CMP), Semiconductor substrates |
| Slicing/Cutting (GC abrasives for wire saws)Machining | – | – | – | – | Single-crystal silicon ingot |
| Grinding (diamond products FDP, FDW, FDC, DIATEC)Machining | – | – | – | – | Optical lenses, Metals, Cemented carbide, Glass, Ferrite, Barium titanate, Alumina |
| Blasting (A, WA, GC)Surface | – | – | – | – | – |
| Thermal spraying (thermal spray with cermet and ceramic powders)Surface | Low surface roughness (WC/Fe) | – | – | Small quantities for prototypes | WC/Co, WC/Co/Cr, WC/NiCr, WC/Hastelloy, WC/Fe, CrC/NiCr, Boride cermet (MoB), Al2O3, Al2O3-TiO2, Oxide ceramics |
| HVOF thermal spray system (ultrafine grain, world first 2002)Surface | – | – | – | – | WC cermet |
| Low temperature spray process (500 °C, WC powder)Surface | – | – | – | – | Tungsten carbide powder, WC/Fe |
2 Anlagen & Maschinen
| Machine | Manufacturer / model | Quantity | Working area | Year built | Site |
|---|---|---|---|---|---|
| Thermal spray system (HVOF, ultrafine-grain) | – | – | – | 2002 | Kakamihigashimachi / Thermal Spray Materials Dept., Kakamigahara, Gifu |
| CMP polishing and measurement equipment (identical to customer equipment) | – | – | – | – | Development centers Japan, USA, Taiwan |
Additional services
Reference customers
Quality & Certifications
All Japanese production plants are certified to ISO 9001 and ISO 14001; thermal spray materials are certified to JIS Q 9100 (aerospace). Customers such as Intel, AMD and TSMC have repeatedly awarded Fujimi supplier quality accolades.
| Evidence | Kiyosu (Biwajima Plant) | Inazawa Plant | Kakamigahara Plant | Kakamihigashimachi Plant | Tualatin (USA) | Kulim (Malaysia) |
|---|---|---|---|---|---|---|
| ISO 9001 | ||||||
| ISO 14001 | ||||||
| JIS Q 9100 (aerospace) |