Develops and manufactures SU-8 functional polymers, photoresists and microstructures for MEMS, LIGA and microelectronics.

Gersteltec Engineering Solutions

Pully (CH)New on Amplifa

2004Founded as an EPFL spin-off

Pully, SwitzerlandLocation

MEMS, LIGA, photonics, microfluidicsBusiness areas

About Gersteltec

Gersteltec Engineering Solutions is a Swiss company founded in 2004 as a spin-off of EPFL, headquartered in Pully. The company develops, manufactures and distributes epoxy photoresists, photo-dielectrics and related products based on SU-8 technology for the production of microstructures such as MEMS, MOMES, BioMEMS and LIGA micro parts. The products can be functionalized with nanoparticles to achieve specific electrical, thermal, physical or optical properties; biocompatible, toxicity-free SU-8 photoresists for microfluidics and neural applications are also available. The range of services extends from custom photoresist formulations, mask and functional design, process development and feasibility studies to prototyping, foundry services in semi-volume production, assembly and packaging. Customers include companies, universities, biotechs, pharmaceutical corporations and start-ups in sectors such as photonics, microfluidics/medtech, the watch industry, inkjet and display technology, and automotive sensors.

Site: Pully
Processes: Manufacture of SU-8 photoepoxy microstructures (MEMS, MOMES, BioMEMS, LIGA), UV-LIGA microfabrication, Microstereolithography (3D micro-stereolithography), Electroforming / electroplating for LIGA micro parts (gears, springs, grippers, metal parts), Micro-Mold Fabrication (SU8 master, SU8 cap, cavities), Nanoimprint lithography, Nanoparticle coating (Coating Nanoparticles, Pips coating), E-beam lithography (E-Beam Resist)
Materials: SU-8 Photoresist (negative epoxy photoresist), Bio-compatible SU-8 photoresist (toxicity-free), Nanocomposite SU-8 Epoxy (electrically/thermally/optically functionalized), Photo-Dielectric, E-Beam Resist, Polyimide, Ceramic composite / aluminum oxide (alumina, sintered), Dielectric and conductive nano-inks
Founded: 2004

01
Custom SU-8 formulation
02
Mask & functional design
03
Process development & scale-up
04
Prototyping / Foundry service (semi-volume production)
05
Assembly & Packaging

Materials & Processes

SU-8

SU-8 Photoresist (negative epoxy photoresist)

Base material for MEMS, MOMES and LIGA microstructures in thick-film technology.

SU-8 bio

Biocompatible SU-8 photoresist (toxicity-free)

For microfluidic chips for diagnostics and neural applications.

SU-8 NC

Nanocomposite SU-8 Epoxy

Functionalized with nanoparticles for electrical, thermal or optical properties.

Photo-Dielectric

Dielectric layers for display and electronics applications, among others.

EBR

E-Beam Resist

Resists for electron beam lithography.

Al2O3

Ceramic composite / aluminum oxide (sintered)

Three-dimensional pure alumina microcomponents produced by microstereolithography.

Ink

Dielectric and conductive nano-inks

For inkjet and display applications.

Locations

Pully

Headquarters, development and production

Materials: SU-8, Nanocomposite Epoxy, ceramic composites

Components & Applications

**Waveguide structure**SU-8 photolithography · Photonics and optics

**LIGA micro gears**UV-LIGA / electroforming · Watch industry

**MEMS component**SU-8 process development · MEMS

**SU-8 replica**Micro-Mold Fabrication · Microsystem technology

**Inkjet-Black SU-8 structure**SU-8 photolithography · Inkjet technology

**Microfluidic component**SU-8 / sacrificial material technology · Microfluidics and medtech

**Nanoparticle coating**Coating · Surface technology

Inside the production

Processes & technical limits

Processes	Tolerance	Max. part	Weight	Lot size	Materials
Manufacture of SU-8 photoepoxy microstructures (MEMS, MOMES, BioMEMS, LIGA)Plastics	–	–	–	–	SU-8, Nanocomposite Epoxy, Bio-compatible SU-8 Photoresists
UV-LIGA microfabricationPlastics	–	–	–	–	SU-8, Composite Photoresists
Microstereolithography (3D micro-stereolithography)Additive	–	–	–	–	Photopolymer, Ceramic composites, Alumina (sintered)
Electroforming / electroplating for LIGA micro parts (gears, springs, grippers, metal parts)Forming	–	–	–	–	Metal
Micro-Mold Fabrication (SU8 master, SU8 cap, cavities)Plastics	–	–	–	–	SU-8
Nanoimprint lithographyPlastics	–	–	–	–	SU-8
Nanoparticle coating (Coating Nanoparticles, Pips coating)Surface	–	–	–	–	Nanoparticle epoxy, SU-8
E-beam lithography (E-Beam Resist)Plastics	–	–	–	–	E-Beam Resist
MEMS/MOMES/LIGA process development, prototyping, foundry service (semi volume production)Engineering	–	–	–	–	SU-8
Packaging and Assembly (WLP, CSP, Bonding, Microfluidic Assembly)Assembly	–	–	–	–	SU-8
Mask Design / Functional Design / Feasibility Studies / Reliability TestingEngineering	–	–	–	–	–

Additional services

PrototypingDevelopment & ConsultingTechnical servicesTailor-made photoresist formulationMask designFunctional designProcess development, optimization and scale upFeasibility studiesReliability testingAssemblyPackaging designTrainingFoundry service / semi volume production

Reference customers

Companies, universities, small firms, biotechs, pharma companies and start-ups

History

2003
Scientific publications on photopolymer microstructures, UV-LIGA and microstereolithography (EPFL research)
2004
Founded as a spin-off of EPFL in Switzerland