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IHP Solutions – Fertigung

ASIC manufacturing in SiGe BiCMOS technology: foundry services, packaging and metrology for industry and research

IHP Solutions Logo

IHP Solutions GmbH

Frankfurt (Oder), GermanyNew on Amplifa

2015Founded as the technology transfer company of IHP
Frankfurt (Oder)Site with 1500 m² cleanroom (Class 3)
200 mm / 0.13 µmWafer size / technology of the SiGe BiCMOS fab
lower double-digit million-euro rangeAnnual revenue
24/7Operating mode of the production line

About IHP Solutions

IHP Solutions GmbH is the commercialization and technology transfer company of the Leibniz Institute for Innovative Microelectronics (IHP) in Frankfurt (Oder), founded in 2015. The company transfers the institute's semiconductor technology to industrial customers and research institutions worldwide. Its core offering is foundry services for application-specific integrated circuits (ASICs) in SiGe BiCMOS technology at 0.25 µm and 0.13 µm on 200-mm wafers, including integrated RF modules and silicon photonics. Chip fabrication takes place in IHP's 1500 m² cleanroom fab (Class 3) operating 24/7 – from prototyping through multi-project wafer and engineering runs to low volume production. In addition, IHP Solutions offers packaging and value added services (grinding, dicing, sorting, advanced packaging, PCB assembly), metrology and test services, IC design services, and IP licensing. Customers are primarily found in RF/microwave technology, wireless communication in higher GHz bands, radar, and silicon photonics. Representatives are based in the USA (Americas/Japan) and in Hong Kong (China/Hong Kong/Taiwan).

Site
Frankfurt (Oder)
Processes
SiGe BiCMOS chip production (MPW runs, 40 ICs per run), Engineering runs (custom production, 6 wafers), Low Volume Production (LVP), Wafer grinding (thinning) 200/300 µm, TAIKO down to 50 µm, Blade dicing, Laser dicing, Stealth dicing, Dicing before grinding
Materials
Silicon, SiGe (silicon-germanium), Copper, Solder (solder balls), SiGe BiCMOS technology (0.25 µm and 0.13 µm), Silicon (200-mm wafers), Silicon photonics on SOI wafers, TSV (through-silicon vias)
Certificates
Measurement & test support (device, functional, analog/RF, digital), Automatic optical inspection (AOI 2D/3D, 0.25 µm/pixel), ISO 9001
Founded
2015
Employees
< 500 (small
Industries
Microelectronics / semiconductor (ASIC manufacturing), RF and microwave technology / radar, Wireless communication (higher GHz bands), Silicon photonics, Research institutions and universities, Microelectronics/semiconductor (ASIC manufacturing)
  1. 01

    IC design and design services (Cadence, ADS)

  2. 02

    Mask/wafer production (MPW, engineering runs)

  3. 03

    Low Volume Production

  4. 04

    Wafer grinding / thinning

  5. 05

    Dicing (blade, laser, stealth)

  6. 06

    AOI inspection

  7. 07

    Die sorting and packaging

  8. 08

    Advanced packaging (RDL, solder balls, flip chip, bonding)

  9. 09

    PCB assembly

  10. 10

    Measurement & test support

Technologies and Processes

SiGe BiCMOS

SiGe BiCMOS technology (0.25 µm and 0.13 µm)

Semiconductor process with integrated HBTs with cutoff frequencies up to 500 GHz for RF and radar applications.

Si

Silicon (200-mm wafers)

Substrate material of chip fabrication, optionally as SOI wafers for photonic design layers.

PIC

Silicon photonics on SOI wafers

Additional photonic design layers combined with BiCMOS BEOL layers for integrated photonic ICs.

TSV

TSV (through-silicon vias)

Option in SG13S/SG13G2 for RF grounding through vias through the silicon.

LBE

Localized backside etching

Local etching of silicon on the wafer backside to improve passive devices.

Cu/RDL

Copper (RDL, copper pillars)

Material for redistribution layers and copper pillars in advanced packaging.

Solder

Solder (solder balls)

Material for bump metallization and flip-chip assembly.

Location

Standort Frankfurt (Oder)

Frankfurt (Oder)

DE

Headquarters; IHP SiGe BiCMOS pilot fab (cleanroom, prototyping, LVP, packaging, metrology)

Lot size
MPW runs (40 ICs per run), engineering runs (6 wafers), low volume production
Materials
Silicon, SiGe (BiCMOS 0.25 µm and 0.13 µm)
  • SiGe BiCMOS wafer fab (200 mm, 0.13 µm), 1500 m² Class 3 cleanroom, 24/7 operation
  • AOI inspection system 2D/3D, max. 0.25 µm/pixel
  • Grinding up to 12" (150–750 µm, TAIKO down to 50 µm)
  • Dicing: blade, laser, stealth, dicing before grinding
  • Die sorting & packaging (waffle pack, vacuum release tray, gel pack, tape)
  • Advanced packaging: RDL, solder balls, copper pillars, flip chip, chip on board, die/wire bonding
  • PCB assembly
  • Measurement and test equipment (device/functional/RF/digital)

Components and Services

ASIC on multi-project wafer (MPW)
ASIC on multi-project wafer (MPW)SiGe BiCMOS manufacturing · semiconductor/RF communication
Packaged ASICs (packaging & VAS)
Packaged ASICs (packaging & VAS)Grinding, dicing, sorting · semiconductor
Advanced packaging (flip chip, RDL, solder balls)
Advanced packaging (flip chip, RDL, solder balls)Advanced packaging · microelectronics
On-wafer measurement
On-wafer measurementMeasurement & test support · RF metrology

Inside the production

Foundry services: prototyping & low volume production
Foundry services: prototyping & low volume production
Wafer grinding (thinning) down to 50 µm (TAIKO)
Wafer grinding (thinning) down to 50 µm (TAIKO)
Wafer dicing: blade, laser and stealth
Wafer dicing: blade, laser and stealth
Die sorting and packaging
Die sorting and packaging
Automatic optical inspection (AOI), 2D/3D
Automatic optical inspection (AOI), 2D/3D
Directions to Frankfurt (Oder)
Directions to Frankfurt (Oder)

Industries

Microelectronics / semiconductor (ASIC manufacturing)RF and microwave technology / radarWireless communication (higher GHz bands)Silicon photonicsResearch institutions and universitiesMicroelectronics/semiconductor (ASIC manufacturing)RF/microwave technology and radar

Processes & technical limits

ProcessesToleranceMax. partWeightLot sizeMaterials
SiGe BiCMOS chip production (MPW runs, 40 ICs per run)Semiconductor manufacturing–200 mm (wafer)–40 ICsSilicon, SiGe
Engineering runs (custom production, 6 wafers)Semiconductor manufacturing–200 mm (wafer)–6 wafersSilicon, SiGe
Low Volume Production (LVP)Semiconductor manufacturing–200 mm (wafer)––Silicon, SiGe
Wafer grinding (thinning) 200/300 µm, TAIKO down to 50 µmSurface and thin-film technology–12" (wafer)––Silicon
Blade dicingCutting/separating–12" (wafer)––Silicon
Laser dicingCutting/separating–12" (wafer)––Silicon
Stealth dicingCutting/separating–12" (wafer)––Silicon
Dicing before grindingCutting/separating–12" (wafer)––Silicon
Automatic optical inspection (AOI), 2D/3D, max. 0.25 µm/pixelTesting/inspection––––Silicon
Die sorting and packaging (waffle pack, vacuum release tray, gel pack, tape)Handling/packaging–––––
PCB assemblyAssembly––––Copper
Redistribution layer (RDL)Packaging/interconnection technology––––Copper
Solder ball placementPackaging/interconnection technology––––Solder, Copper
Copper pillar placementPackaging/interconnection technology––––Copper
Flip chipPackaging/interconnection technology–––––
Chip on boardPackaging/interconnection technology–––––
Die bondingPackaging/interconnection technology–––––
Wire bondingPackaging/interconnection technology–––––
On-wafer measurements (device/functional/RF/digital)Testing/inspection–200 mm (wafer)–––
IC design services / PCB designEngineering/design–––––

2 Anlagen & Maschinen

MachineManufacturer / modelQuantityWorking areaYear builtSite
SiGe BiCMOS pilot foundry (wafer fab)IHP–1500 m² Class 3 cleanroom, 200 mm wafers, 0.13 µm technology–Frankfurt (Oder)
AOI inspection system (2D/3D)––Max. resolution 0.25 µm/pixel–Frankfurt (Oder)

Additional services

Foundry services (SiGe BiCMOS 0.25 µm and 0.13 µm)Prototyping: MPW runs (40 ICs per run) and engineering runs (6 wafers)Low Volume ProductionPackaging & value added services (grinding up to 12", dicing: blade/laser/stealth, AOI, sorting &Advanced packaging: RDL, solder balls, copper pillars, flip chip, chip on board, die/wire bonding,Measurement & test support (device measurements, functional testing, analog/RF, digital)Design services (IC design, PCB design)IP licensing and design blocks proven in siliconTSV option, LBE (localized backside etching), photonic design layers (PIC on SOI wafers)Design kits (Cadence, ADS)

Quality and Metrology

IHP Solutions offers access to IHP's full measurement and test equipment, including automatic optical inspection (AOI, 2D/3D) with a maximum resolution of 0.25 µm/pixel as well as device, functional, analog/RF and digital measurements. Manufacturing and packaging take place in a 1500 m² Class 3 cleanroom in 24/7 operation.

EvidenceFrankfurt (Oder)
Measurement & test support (device, functional, analog/RF, digital)
Automatic optical inspection (AOI 2D/3D, 0.25 µm/pixel)
ISO 9001

History

  1. 2015

    Foundation of IHP Solutions GmbH as the commercialization and technology transfer company of the Leibniz Institute for Innovative Microelectronics (IHP).

  2. 2022

    Mirtha Valenzuela Vera becomes sole managing director on 15.11.2022.

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