Development of optical instruments for laser-driven EUV sources from VUV to soft X-ray.
Indigo Optical Systems GmbH
New on Amplifa
About Indigo Optical Systems
Indigo Optical Systems GmbH develops high-performance optical instruments for laser-driven EUV sources, serving both scientific research and the semiconductor industry. The portfolio comprises custom optical solutions from vacuum ultraviolet (VUV, approx. 200 nm) to extreme ultraviolet (EUV) and soft X-ray (SXR, approx. 2 nm) for spectroscopy, imaging and diagnostics. In addition, the company offers non-destructive EUV inspection using digital microscopy for optics, masks, logic devices, wafers and integrated circuits, as well as beamline design and spectrometry with high-resolution spectrometers, monochromators, reflectometers and interferometers. Further focal points include solutions for attosecond and time-resolved pump-probe experiments as well as applications such as ARPES, NEXAFS, coherent diffraction imaging, reflectometry and scatterometry. Supported light sources include high-harmonic generation, plasma-based sources, synchrotrons and free-electron lasers.
- Processes
- Custom Optical Solutions – Instruments for VUV (~200 nm) to EUV and Soft X-Ray (SXR, ~2 nm), Non-Destructive EUV Inspection – digital microscopy for non-destructive inspection of optics,, Beamline Design & Spectrometry – high-resolution spectrometers, monochromators, reflectometers and, Attosecond & Time-Resolved Experiments – pump-probe experiments with attosecond resolution, Angle-resolved photoelectron spectroscopy (ARPES), Near-edge x-ray absorption fine structure (NEXAFS), Coherent diffraction imaging (CDI), Reflectometry & Scatterometry
- Materials
- EUV and SXR optics, High-Harmonic Generation, Plasma-based sources, Synchrotron radiation, Free-electron lasers
- Industries
- Scientific Research, Semiconductor Industry, Ultrafast Science
- 01
Requirements analysis and consulting
- 02
Optical design and engineering
- 03
Instrument development
- 04
Inspection and metrology
- 05
Application support
Materials and Processes
EUV and SXR optics
Optical instruments for wavelength ranges from approx. 200 nm (VUV) to approx. 2 nm (soft X-ray) for spectroscopy and imaging.
High-Harmonic Generation
Use as a source for ultrafast EUV and X-ray experiments.
Plasma-based sources
Compact, high-energy photon generation for various applications.
Synchrotron radiation
High-brilliance X-ray sources for demanding spectroscopy and imaging.
Free-electron lasers
Intense, coherent radiation for research applications.
Instruments and Applications
Inside the production
Industries
Processes & technical limits
| Processes | Tolerance | Max. part | Weight | Lot size | Materials |
|---|---|---|---|---|---|
| Custom Optical Solutions – Instruments for VUV (~200 nm) to EUV and Soft X-Ray (SXR, ~2 nm)Engineering | – | – | – | – | – |
| Non-Destructive EUV Inspection – digital microscopy for non-destructive inspection of optics,Testing | – | – | – | – | – |
| Beamline Design & Spectrometry – high-resolution spectrometers, monochromators, reflectometers andEngineering | – | – | – | – | – |
| Attosecond & Time-Resolved Experiments – pump-probe experiments with attosecond resolutionEngineering | – | – | – | – | – |
| Angle-resolved photoelectron spectroscopy (ARPES)Testing | – | – | – | – | – |
| Near-edge x-ray absorption fine structure (NEXAFS)Testing | – | – | – | – | – |
| Coherent diffraction imaging (CDI)Testing | – | – | – | – | – |
| Reflectometry & ScatterometryTesting | – | – | – | – | – |
Additional services
History
- 2021
ISO publication date of the website in January 2021; the year refers to this date.