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IONTOF – Fertigung

Development and manufacture of TOF-SIMS and LEIS instruments for surface analysis as well as analytical services in cooperation with Tascon.

IO

IONTOF GmbH

MünsterNew on Amplifa

1989Founded
4 companies in Germany, USA andIONTOF Group
TOF-SIMS, LEIS, SPMMethods
HRB 10680, Amtsgericht MünsterCommercial register

About IONTOF

IONTOF GmbH, based in Münster, develops and manufactures instruments for surface analysis based on ion beam technology. The product portfolio comprises TOF-SIMS instruments (Time-of-Flight Secondary Ion Mass Spectrometry) of the M6, M6 Plus and M6 Hybrid SIMS series as well as the LEIS instrument Qtac for quantitative characterization of the topmost atomic layer (Low Energy Ion Scattering). The instruments enable surface spectroscopy, surface imaging, depth profiling in dual-beam mode, 3D analysis, retrospective analysis and TOF MS/MS with CID fragmentation; the M6 Plus platform combines SIMS with in-situ scanning probe microscopy (SPM). The material classes analyzed include metals, semiconductors, polymers, glass, ceramics, biomaterials and pharmaceuticals. Applications are found in industries such as semiconductors, pharmaceuticals, paints and coatings, paper and catalysis. For analytical services, IONTOF cooperates closely with its sister company Tascon in Münster; the IONTOF Group comprises four companies in Germany, the USA and Japan. The headquarters are located in the Technologiehof near the University of Münster.

Site
Münster
Processes
TOF-SIMS (Time-of-Flight Secondary Ion Mass Spectrometry) - surface analysis,, LEIS (Low Energy Ion Scattering) - quantitative characterization of the topmost atomic layer, TOF MS/MS with CID fragmentation for molecular structure elucidation, Dual-beam depth profiling, In-situ SPM (Scanning Probe Microscopy) combined with SIMS, Orbitrap SIMS for organic SIMS applications, Sample heating and cooling during analysis (closed-loop), Analytical services (surface analysis, in cooperation with Tascon; also XPS and optical
Materials
Metals, Semiconductors, Polymers, Glass, Ceramics, Biomaterials, Pharmaceuticals, Paints and coatings
Certificates
Analytical services (TOF-SIMS, LEIS, XPS), ISO 9001
Founded
1989
Industries
Semiconductors, Polymers, Paints and coatings, Biomaterials, Pharmaceuticals, Glass
  1. 01

    Development of ion technology and mass spectrometers

  2. 02

    Engineering and design of the instruments

  3. 03

    Manufacture and assembly of the TOF-SIMS and LEIS instruments

  4. 04

    Software development (SurfaceLab 7)

  5. 05

    Analytical services with Tascon

  6. 06

    Service, training and worldwide support

Analytical methods and analyzed materials

SIMS

TOF-SIMS (Time-of-Flight Secondary Ion Mass Spectrometry)

Highly sensitive surface analysis for spectroscopy, imaging, depth profiles and 3D analysis on metals, semiconductors, polymers, glass, ceramics and biomaterials.

LEIS

LEIS (Low Energy Ion Scattering)

Quantitative characterization of the topmost atomic layer, especially for catalysts and metals.

MS/MS

TOF MS/MS with CID fragmentation

Molecular structure elucidation, e.g. for polymers and organic samples.

SPM

In-situ SPM combined with SIMS

Combination of high-resolution SIMS analysis and scanning probe microscopy on the M6 Plus platform.

Orbitrap

Orbitrap SIMS

For organic SIMS applications on the M6 Hybrid SIMS combination instrument.

DB

Dual-beam depth profiling

Sputtering and analysis with separate ion beams for depth profiles and 3D analysis.

Locations

Standort Münster

Münster

DE

Headquarters with development, manufacture and assembly of the instruments

Materials
Metals, semiconductors, polymers, glass, ceramics, biomaterials, pharmaceuticals, paints and coatings, paper
  • M6
  • M6 Plus
  • M6 Hybrid SIMS
  • Qtac
  • Nanoprobe 50 (bismuth cluster ion source)
  • SurfaceLab 7

Inside the production

TOF-SIMS: non-destructive surface analysis
TOF-SIMS: non-destructive surface analysis
Depth profiling in dual-beam mode
Depth profiling in dual-beam mode
3D analysis with parallel mass detection
3D analysis with parallel mass detection
Principle of LEIS: scattering of noble gas ions at surface atoms
Principle of LEIS: scattering of noble gas ions at surface atoms
LEIS: energy spectrum of the scattered ions
LEIS: energy spectrum of the scattered ions

Industries

SemiconductorsPolymersPaints and coatingsBiomaterialsPharmaceuticalsGlassPaperMetalsCatalysts

Processes & technical limits

ProcessesToleranceMax. partWeightLot sizeMaterials
TOF-SIMS (Time-of-Flight Secondary Ion Mass Spectrometry) - surface analysis,Testing––––Metals, Semiconductors, Polymers, Glass, Ceramics, Biomaterials, Pharmaceuticals, Paper, Paints and coatings, Organic tissue
LEIS (Low Energy Ion Scattering) - quantitative characterization of the topmost atomic layerTesting––––Catalysts, Metals
TOF MS/MS with CID fragmentation for molecular structure elucidationTesting––––Polymers, Organic samples
Dual-beam depth profilingTesting–––––
In-situ SPM (Scanning Probe Microscopy) combined with SIMSTesting–––––
Orbitrap SIMS for organic SIMS applicationsTesting––––Organic materials
Sample heating and cooling during analysis (closed-loop)Testing–––––
Analytical services (surface analysis, in cooperation with Tascon; also XPS and opticalTesting––––Metals, Semiconductors, Polymers, Glass, Biomaterials, Pharmaceuticals, Catalysts

5 Anlagen & Maschinen

MachineManufacturer / modelQuantityWorking areaYear builtSite
TOF-SIMS instrument (high-end)IONTOF M6–––Münster, Germany
TOF-SIMS + in-situ SPM platformIONTOF M6 Plus–––Münster, Germany
TOF-SIMS/Orbitrap combination instrumentIONTOF M6 Hybrid SIMS–––Münster, Germany
LEIS instrument (Low Energy Ion Scattering)IONTOF Qtac–––Münster, Germany
Bismuth cluster ion source (up to 40 pA pulsed, lateral resolution < 50 nm, up to 50 kHz)IONTOF Nanoprobe 50–––Münster, Germany

Additional services

Analytical services (in cooperation with Tascon)Service and worldwide support around the clockRemote supportSoftware updates and download areaTraining (IONTOF User School)Group with four companies in Germany, the USA and Japan

Quality

IONTOF itself operates TOF-SIMS and LEIS instruments in close cooperation with the testing laboratory Tascon; analytical services include XPS and optical characterization of the surface topography.

EvidenceMünster
Analytical services (TOF-SIMS, LEIS, XPS)
ISO 9001

History

  1. 1989

    Founded by Prof. Alfred Benninghoven, Dr. Ewald Niehuis and Thomas Heller to commercialize the TOF-SIMS research of the University of Münster

  2. 1997

    Foundation of the sister company Tascon as a specialized TOF-SIMS testing laboratory

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