
Special-purpose systems for plasma technology and CVD systems for diamond synthesis based on the patented CYRANNUS® technology

iplas Innovative Plasma Systems GmbH
Troisdorf, GermanyNew on Amplifa
About iplas
iplas Innovative Plasma Systems GmbH develops and manufactures special-purpose systems for innovative plasma technology at its Troisdorf site. The company was founded in 1997 by Dr.-Ing. Hildegard Sung-Spitzl and Dr. rer. nat. Ralf Spitzl and is regarded as a pioneer of plasma technology with the CYRANNUS® MWCVD plasma source, invented and patented in 1995. Its core products are highly efficient CVD production systems for diamond synthesis, used to produce diamond layers of electronic quality (wafers or crystals) as well as diamond gemstones. Further fields of application include plasma activation of plastics and biocompatible surfaces, environmentally friendly etching and fine cleaning, decomposition of stable chemicals in exhaust gases (plasma cracking), and gas activation for hydrogen and power-to-gas concepts. Customized plasma processes are developed in the company's own development laboratory, where prototypes and small pilot series are also manufactured; in addition, iplas offers fabless manufacturing and a CVD training center. The systems are exported worldwide; most commercially operated systems are based on CYRANNUS® technology.
- Site
- Troisdorf
- Processes
- CVD diamond synthesis (MWCVD, CYRANNUS® technology), production of diamond gemstones and, Plasma activation of plastics and production of biocompatible surfaces, Environmentally friendly etching and fine cleaning of surfaces, Plasma cracking / decomposition of stable chemicals in exhaust gases, activation of gases (H2,, Development of customized plasma processes, manufacture of prototypes and small pilot series, Development and manufacture of special-purpose systems for plasma technology, CVD systems for diamond synthesis, Plasma activation of plastics and biocompatible surfaces
- Materials
- Synthetic diamond (diamond layers, crystals, gemstones), Plastic (for plasma activation), CVD diamond synthesis (MWCVD), CYRANNUS® MWCVD plasma source, Plasma activation, Plasma cracking / gas activation, Plastic
- Founded
- 1997
- Industries
- Semiconductor industry, Diamond synthesis / gemstones, Environmental technology, Renewable energies / power-to-gas, Modern production technology, New materials
- 01
Engineering and process development in the company's own development laboratory
- 02
Manufacturing of CYRANNUS® special-purpose systems
- 03
Prototypes and pilot series in the development laboratory
- 04
Fabless manufacturing
- 05
Training at the CVD training center
Materials and Processes
CVD diamond synthesis (MWCVD)
Production of diamond layers of electronic quality (wafers or crystals) as well as diamond gemstones using CYRANNUS® plasma sources.
CYRANNUS® MWCVD plasma source
Proprietary, internationally patented microwave CVD plasma source for semiconductor-grade surface processes.
Plasma activation
Activation of plastic surfaces and production of biocompatible surfaces.
Plasma cracking / gas activation
Decomposition of stable chemicals in exhaust gases and activation of gases such as H2 for power-to-gas applications.
Plastic
Substrate material for plasma activation and surface treatment.
Sites

Troisdorf
DEHeadquarters, development and manufacturing
- Lot size
- Prototypes, pilot series, small series
- Materials
- Diamond (synthetic), plastic
- CYRANNUS® 5.8 GHz plasma system
- CYRANNUS® 915 MHz Diamond Gemstone Production System
- Fully automated DIAMOND laboratory system
- Development laboratory
- CVD training center
Inside the production


Industries
Processes & technical limits
| Processes | Tolerance | Max. part | Weight | Lot size | Materials |
|---|---|---|---|---|---|
| CVD diamond synthesis (MWCVD, CYRANNUS® technology), production of diamond gemstones andEngineering | – | – | – | – | Diamond (synthetic) |
| Plasma activation of plastics and production of biocompatible surfacesSurface | – | – | – | – | Plastic |
| Environmentally friendly etching and fine cleaning of surfacesSurface | – | – | – | – | – |
| Plasma cracking / decomposition of stable chemicals in exhaust gases, activation of gases (H2,Surface | – | – | – | – | – |
| Development of customized plasma processes, manufacture of prototypes and small pilot seriesEngineering | – | – | – | – | – |
3 Anlagen & Maschinen
| Machine | Manufacturer / model | Quantity | Working area | Year built | Site |
|---|---|---|---|---|---|
| CYRANNUS® plasma source/system (MWCVD, 5.8 GHz) | iplas Innovative Plasma Systems GmbH CYRANNUS® 5,8 GHz | – | – | 2012 | Troisdorf |
| CYRANNUS® plasma system 915 MHz for diamond production | iplas Innovative Plasma Systems GmbH CYRANNUS® 915 MHz Diamond Gemstone Production System | – | – | 2015 | Troisdorf |
| Fully automated DIAMOND laboratory system | iplas Innovative Plasma Systems GmbH | – | – | 2010 | Troisdorf |
Additional services
History
- 1995
Invention and patenting of the CYRANNUS® MWCVD plasma source
- 1997
Founding of iplas Innovative Plasma Systems GmbH by Hildegard Sung-Spitzl and Ralf Spitzl; CYRANNUS® plasma source for R&D
- 1999
CYRANNUS® plasma systems for various applications
- 2000
Winner of the 'Idee Förderpreis' (Young Entrepreneur of the Year)
- 2001
Relocation of headquarters to its own premises in Troisdorf
- 2002
R&D100 Company of the World award
- 2005
Introduction of CYRANNUS® for diamond gemstones
- 2008
Introduction of the first 915 MHz plasma system
- 2010
Introduction of fully automated DIAMOND laboratory systems
- 2012
First 5.8 GHz CYRANNUS® plasma system commissioned; CYRANNUS® for plasma cracking, H2 and renewable energy concepts
- 2013
First commercial diamond gemstone factory
- 2014
FAST 50 Technology Award (Deloitte) – inclusion in the list of the 50 fastest-growing technology companies in Germany
- 2015
Market launch of the first 915 MHz CYRANNUS® system for diamond production
- 2018
Launch of the CVD training center