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LFoundry – Fertigung

Contract manufacturer for analog, mixed-signal and specialized semiconductor technologies on 200-mm silicon wafers

LFoundry Logo

LFoundry S.r.l.

Avezzano (IT) · Landshut (DE)New on Amplifa

2008Founded (Landshut, Germany)
1,300+Employees
40,000 wafers/monthFab capacity (200 mm)
200 mmWafer size; minimum feature size 65 nm, 90 nm in
USD 112.8 million100% acquisition by Wuxi Xichanweixin (2019)

About LFoundry

LFoundry S.r.l. is a custom semiconductor manufacturer (foundry) with company headquarters and production in Avezzano, Italy. The company produces integrated circuits and specialized devices on 200-mm silicon wafers using its own technologies for 150-nm and 110-nm nodes as well as optimized CMOS image sensor (CIS) processes down to 90 nm, including back-side illumination (BSI). This is complemented by optoelectronics such as SiPM, SPAD and X-ray detectors, smart-power processes (LDMOS), MEMS, wafer thinning and stacking, DBI bonding (3D stacking), lithographic stitching, and back-end services such as wafer testing and prototype packaging. With MPW and MLM services, PDKs, IP portfolios and reference flows, LFoundry supports customers from development to volume production. Target industries include automotive, industrial, medical technology, security, science, space imaging and telecommunications. The Avezzano plant achieves a capacity of 40,000 wafers per month; sales, marketing and R&D are located in Landshut, Germany.

Site
Avezzano (AQ)
Processes
CMOS semiconductor manufacturing 150 nm (base process 1.8V MOS, 3.3V/5V options, up to 6 Al metal, CMOS semiconductor manufacturing 110 nm (1.2V core, 4-6 metal layers, lithography down to 193nm ArF), CMOS image sensor (CIS) manufacturing with optimized processes down to 90nm, Back-side illumination (BSI) technology, Optoelectronics manufacturing (SiPM, SPAD, X-ray detectors), Smart power manufacturing (LDMOS), MEMS manufacturing, Back-end services: wafer testing
Materials
Silicon (200mm wafer), Silicon (200-mm wafers), 150 nm CMOS technology, 110 nm CMOS technology, CMOS Image Sensor (CIS/BSI) down to 90 nm, Smart Power / LDMOS, MEMS manufacturing, Al and Cu metallization
Certificates
ISO 9001:2015, IATF 16949:2016, TL9000, OHSAS 18001, ISO 14001, ISO 9001:2015 (DEKRA), IATF 16949:2016 (DEKRA)
Founded
2008
Employees
1300+
Industries
Automotive, Industrial, Medical Technology, Security, Science, Space Imaging
  1. 01

    Design Enablement (PDK, IP, Reference Flows)

  2. 02

    MPW/MLM Service

  3. 03

    Wafer manufacturing (CMOS 150/110 nm, CIS down to 90 nm)

  4. 04

    Specialty modules (BSI, thinning, stacking, DBI bonding)

  5. 05

    Back-end services (wafer testing, prototype packaging)

  6. 06

    Delivery to customers worldwide

Technologies & Processes

Si-200mm

Silicon (200-mm wafers)

Base material of the entire CMOS and sensor specialty manufacturing.

150nm

150 nm CMOS technology

1.8 V MOS base process with 3.3 V/5 V options, up to 6 aluminum metal layers and LDMOS up to 200 V for mixed-signal, RF and high voltage.

110nm

110 nm CMOS technology

1.2 V core process with 4–6 metal layers, lithography down to 193 nm ArF, for high-performance analog and digital products.

CIS

CMOS Image Sensor (CIS/BSI) down to 90 nm

Optimized processes including back-side illumination for image sensors, among other things in automotive and industrial applications.

LDMOS

Smart Power / LDMOS

High-voltage power processes up to 200 V for automotive and industrial applications.

MEMS

MEMS manufacturing

Micro-mechanical devices based on standard and specialty CMOS processes.

Al/Cu

Al and Cu metallization

Aluminum standard metallization with copper back-end-of-line for volume production at 90 nm.

Locations

Standort Avezzano

Avezzano

IT

Company headquarters and manufacturing (200-mm fab)

Lot size
MPW/MLM up to volume production; capacity of 40,000 wafers/month
Materials
Silicon; CMOS 150/110 nm, CIS down to 90 nm, LDMOS, MEMS
  • 200-mm semiconductor fab
  • 193-nm ArF lithography
  • Cleanroom manufacturing
  • Wafer testing (back-end)

Landshut

DE

Sales, marketing and R&D

Manufacturing Services

CMOS Image Sensors (CIS/BSI)
CMOS Image Sensors (CIS/BSI)CMOS down to 90 nm · Automotive, industrial, medical technology
Analog/mixed-signal ICs
Analog/mixed-signal ICsCMOS 150/110 nm · Industrial, telecommunications
Optoelectronic detectors (SiPM, SPAD, X-ray)
Optoelectronic detectors (SiPM, SPAD, X-ray)Si specialty processes · Security, science, space imaging
Smart power devices (LDMOS)
Smart power devices (LDMOS)High voltage up to 200 V · Automotive

Inside the production

Urania
Urania

Industries

AutomotiveIndustrialMedical TechnologySecurityScienceSpace ImagingTelecommunicationsTelecom

Processes & technical limits

ProcessesToleranceMax. partWeightLot sizeMaterials
CMOS semiconductor manufacturing 150 nm (base process 1.8V MOS, 3.3V/5V options, up to 6 Al metalAdditive–200 mm wafer–40,000 wafers/month (total capacity)Silicon
CMOS semiconductor manufacturing 110 nm (1.2V core, 4-6 metal layers, lithography down to 193nm ArF)Additive–200 mm wafer––Silicon
CMOS image sensor (CIS) manufacturing with optimized processes down to 90nmAdditive–200 mm wafer––Silicon
Back-side illumination (BSI) technologyAdditive–200 mm wafer––Silicon
Optoelectronics manufacturing (SiPM, SPAD, X-ray detectors)Additive––––Silicon
Smart power manufacturing (LDMOS)Additive––––Silicon
MEMS manufacturingAdditive––––Silicon
Back-end services: wafer testingTesting–200 mm wafer––Silicon
Back-end services: prototype packagingJoining––––Silicon
DBI bonding (3D stacking)Joining–200 mm wafer––Silicon
Wafer thinningSurface–200 mm wafer––Silicon
Design enablement / design services (PDK, IP portfolio, reference flows)Engineering–––––
MPW (multi-project wafer) and MLM servicesAdditive–––––

2 Anlagen & Maschinen

MachineManufacturer / modelQuantityWorking areaYear builtSite
Semiconductor fab (200mm manufacturing plant)–1200mm wafer–Avezzano, Italy
193nm ArF lithography––––Avezzano, Italy

Additional services

MPW (multi-project wafer)MLM (multi-level mask)CMOS image sensor processes (CIS down to 90 nm, back-side illumination)Back-end services (wafer testing, prototype packaging)Wafer thinning and stackingDBI bonding (3D stacking)Lithographic stitchingOptoelectronics support (SiPM, SPAD, X-ray)

Quality Management

The quality management system in accordance with ISO 9001:2015 and IATF 16949:2016 (DEKRA) covers the manufacturing of integrated circuits. Production environment, process control (SPC, FDC, APC) and supplier management are fully automated and follow APQP principles.

EvidenceAvezzano
ISO 9001:2015 (DEKRA)
IATF 16949:2016 (DEKRA)
ISO 14001
OHSAS 18001
TL9000

History

  1. 1992

    Fab in Landshut built by Hitachi (Renesas predecessor)

  2. 2008

    Founding of LFoundry in Landshut, Germany

  3. 2010

    Acquisition of the Landshut plant from Renesas for €1; purchase of the factory in Rousset (France) from Atmel

  4. 2011

    Insolvency and closure of the Landshut plant (October 6, 2011)

  5. 2013

    Insolvency of LFoundry Rousset SAS; Micron acquires the Avezzano plant

  6. 2014

    New corporate structure in Avezzano, Italy

  7. 2016

    SMIC acquires 70% of LFoundry S.r.l. in Avezzano

  8. 2017

    SMIC awards the Avezzano site the 'A1 Outstanding Contribution Fab' prize

  9. 2018

    Co-founding of the Hubruzzo Foundation (February 5, 2018)

  10. 2019

    100% acquisition by Wuxi Xichanweixin Semiconductor for USD 112.8 million

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