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NovaWave – Fertigung

Develops GaN and SiC power semiconductors, driver ICs and system-in-package solutions for efficient power electronics.

NovaWave Logo

NovaWave AG

Biel (Switzerland) · Shenzhen (China)New on Amplifa

2021Founded
Biel, SwitzerlandHeadquarters in the Swiss Innovation Park
FablessManufacturing via foundry partner DB HiTek (Korea)

About NovaWave

NovaWave is a Swiss provider founded in 2021 of innovative solutions for next-generation wide-bandgap power devices. The company specializes in advanced GaN and driver technologies and offers a portfolio that includes driver ICs for GaN, SiC, IGBTs and MOSFETs, GaN power switches (HEMTs and bare die) as well as complete system-in-package solutions. Added to this are the GaN-on-Si Schottky barrier diode Flash-SBD and the proprietary epitaxy platform GaN-on-QST. NovaWave operates as a fabless company: wafer fabrication of the E-mode GaN power devices is handled by the Korean foundry partner DB HiTek. The headquarters with R&D and design center is located in Biel in the Swiss Innovation Park; an office in Shenzhen ensures worldwide customer support. The products serve applications in consumer electronics, wireless charging, AI and data centers, robotics, industrial power supplies and e-mobility.

Site
Biel, Switzerland
Processes
GaN/SiC power devices and driver solutions, Smart-GaN™ SiP (system-in-package: integrated GaN HEMT and driver IC), Smart-Drive™ IC – driver IC for GaN, SiC, IGBTs and MOSFETs, Flash-SBD™ – GaN-on-Si Schottky barrier diode (2A – 8A), GaN HEMTs and bare die (650V, 100 – 600mΩ Rdson), GaN epitaxial growth (GaN-on-QST platform), Driver ICs for GaN, SiC, IGBTs and MOSFETs, GaN power switches (HEMTs, bare die)
Materials
Gallium Nitride (GaN), Silicon Carbide (SiC), Silicon, Gallium nitride (GaN), Silicon carbide (SiC), QST substrate
Founded
2021
Industries
Consumer electronics / fast chargers, Wireless charging, Data centers and AI infrastructure, Renewable energies and industrial power supplies, Electric and hybrid vehicles, Robotics and automation
  1. 01

    Device and circuit design (R&D, Biel)

  2. 02

    GaN epitaxy technology (GaN-on-QST)

  3. 03

    Wafer fabrication by foundry partner DB HiTek

  4. 04

    Packaging / system-in-package (SiP)

  5. 05

    Test and validation

  6. 06

    Global customer support (Biel, Shenzhen)

Materials & Technologies

GaN

Gallium nitride (GaN)

Wide-bandgap semiconductor for higher switching speeds, lower switching losses and higher power density than silicon.

SiC

Silicon carbide (SiC)

Wide-bandgap material for driver ICs and power applications in industrial electronics.

Si

Silicon

Substrate material for the GaN-on-Si Schottky barrier diodes (Flash-SBD).

QST

QST substrate

Substrate platform for the proprietary GaN epitaxy technology GaN-on-QST.

Sites

Biel

CH

Headquarters, R&D and design center in the Swiss Innovation Park

Materials
GaN, SiC

Shenzhen

CN

Office for global customer support

Products & Devices

Smart-GaN™ SiP (650 V, 280–900 mΩ Rdson, integrated GaN HEMT and driver IC)
Smart-GaN™ SiP (650 V, 280–900 mΩ Rdson, integrated GaN HEMT and driver IC)System-in-Package · Power Electronics
Smart-Drive™ IC (driver IC for GaN, SiC, IGBTs, MOSFETs)
Smart-Drive™ IC (driver IC for GaN, SiC, IGBTs, MOSFETs)Driver IC · Power Electronics
Flash-SBD™ (GaN-on-Si Schottky barrier diode, 2–8 A)
Flash-SBD™ (GaN-on-Si Schottky barrier diode, 2–8 A)GaN-on-Si · Power Electronics
GaN HEMTs and bare die (650 V, 100–600 mΩ Rdson)
GaN HEMTs and bare die (650 V, 100–600 mΩ Rdson)GaN HEMT · Power Electronics

Inside the production

GaN/SiC power devices and driver solutions
GaN/SiC power devices and driver solutions
GaN-on-QST epitaxy technology
GaN-on-QST epitaxy technology
Smart-GaN™ technology
Smart-GaN™ technology
Smart-Driver™ technology
Smart-Driver™ technology
Flash-SBDs™ technology
Flash-SBDs™ technology

Industries

Consumer electronics / fast chargersWireless chargingData centers and AI infrastructureRenewable energies and industrial power suppliesElectric and hybrid vehiclesRobotics and automationAerospaceAerospace (cryogenic / hydrogen-electric aviation, research)

Processes & technical limits

ProcessesToleranceMax. partWeightLot sizeMaterials
GaN/SiC power devices and driver solutionsEngineering––––Gallium Nitride (GaN), Silicon Carbide (SiC)
Smart-GaN™ SiP (system-in-package: integrated GaN HEMT and driver IC)Engineering––––Gallium Nitride (GaN)
Smart-Drive™ IC – driver IC for GaN, SiC, IGBTs and MOSFETsEngineering––––Gallium Nitride (GaN), Silicon Carbide (SiC)
Flash-SBD™ – GaN-on-Si Schottky barrier diode (2A – 8A)Engineering––––Gallium Nitride (GaN), Silicon
GaN HEMTs and bare die (650V, 100 – 600mΩ Rdson)Engineering––––Gallium Nitride (GaN)
GaN epitaxial growth (GaN-on-QST platform)Engineering––––Gallium Nitride (GaN), QST substrate

Additional services

Driver ICs for GaN, SiC, IGBTs and MOSFETsGaN power switches (HEMTs, bare die)System-in-package (SiP) solutionsGaN-on-QST epitaxy technologyFlash-SBD (Schottky barrier diodes)Smart-Driver technology

Reference customers

DB HiTek (foundry partner, not a customer)University of Strathclyde (research partner)

History

  1. 2021

    Founded by a team of experts from power electronics with industrial and academic backgrounds; team members (Dr. Nela, Dr. Erne) publish a research paper on multi-channel nanowire devices in Nature Electronics.

  2. 2022

    Opening of the headquarters in Biel in the Swiss Innovation Park as the central R&D and design center.

  3. 2024

    Participation in PCIM Europe 2024 in Nuremberg (booth 6-210).

  4. 2026

    Selection of DB HiTek (Korea) as foundry partner for the manufacturing of E-mode GaN power devices; participation in PCIM Europe 2026 in Nuremberg; joint test series with the University of Strathclyde: GaN driver chips of the 2511U1 series operate at –196 °C in liquid nitrogen.

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