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SiCrystal – Fertigung

Manufacture of single-crystal silicon carbide substrates and wafers for the semiconductor industry.

SiCrystal Logo

SiCrystal GmbH

NurembergNew on Amplifa

HRB No. 34957, Nuremberg Local CourtRegister court
NurembergLocation
150 mm / 350 µmTypical wafer diameter / thickness
Rohm Group (Japan)Corporate group

About SiCrystal

SiCrystal GmbH, based in Nuremberg, produces and supplies high-quality single-crystal silicon carbide substrates (SiC wafers), which serve as the basis for manufacturing innovative, energy-efficient electronic components. Single-crystal silicon carbide is a transparent, extremely hard and temperature-insensitive semiconductor material with exceptional electrical properties. The typical wafers have a diameter of 150 millimeters and a thickness of 350 micrometers and must meet a specification defined in detail by the customer. The company covers all manufacturing steps: in-house production of the key raw materials, high-temperature crystal growth from the gas phase, precise mechanical machining of crystals and wafers, as well as semiconductor-compatible cleaning and final quality control in the cleanroom. In addition to standard-quality wafers for industrial further processing at leading semiconductor groups, Engineering-Grade wafers for research and development are offered. SiCrystal is a company of the Japanese Rohm Group and supplies key customers worldwide in the fields of the semiconductor industry, industry, and research and development.

Site
Nuremberg
Processes
High-temperature crystal growth from the gas phase (SiC crystal growth), Precise mechanical machining of crystals and wafers, Semiconductor-compatible cleaning, Final quality control in the cleanroom, In-house production of the key raw materials for crystals
Materials
Single-crystal silicon carbide (SiC substrates/wafers), Single-crystal silicon carbide, High-temperature crystal growth from the gas phase, Precise mechanical machining
Certificates
ISO 9001, ISO 14001, ISO 45001, ISO 50001
Industries
Semiconductor industry, Industry, Research and development
  1. 01

    In-house production of the key raw materials for crystals

  2. 02

    High-temperature crystal growth from the gas phase

  3. 03

    Precise mechanical machining of crystals and wafers

  4. 04

    Semiconductor-compatible cleaning

  5. 05

    Final quality control in the cleanroom

Materials and Processes

SiC

Single-crystal silicon carbide

Transparent, extremely hard and temperature-insensitive semiconductor material for energy-efficient electronic components.

SiC-PWD

High-temperature crystal growth from the gas phase

Process for growing single-crystal silicon carbide crystals from in-house produced raw materials.

SiC-MEC

Precise mechanical machining

Machining of crystals and wafers with high precision up to customer specification.

Locations

Standort Nuremberg

Nuremberg

DE

Headquarters with production, goods receiving and sales

Materials
Single-crystal silicon carbide
  • Buildings A, B & C
  • Cleanroom

Products

SiC substrates/wafers standard quality (150 mm)
SiC substrates/wafers standard quality (150 mm)High-temperature crystal growth · Semiconductor industry
Engineering-Grade wafers
Engineering-Grade wafersCrystal growth and machining · Research and development

Inside the production

SiCrystal Nuremberg manufacturing
SiCrystal Nuremberg manufacturing
Wafer production process chain
Wafer production process chain

Industries

Semiconductor industryIndustryResearch and development

Processes & technical limits

ProcessesToleranceMax. partWeightLot sizeMaterials
High-temperature crystal growth from the gas phase (SiC crystal growth)Casting––––Single-crystal silicon carbide
Precise mechanical machining of crystals and wafersMachining––––Single-crystal silicon carbide
Semiconductor-compatible cleaningSurface––––Single-crystal silicon carbide
Final quality control in the cleanroomTesting––––Single-crystal silicon carbide
In-house production of the key raw materials for crystalsEngineering––––Single-crystal silicon carbide

Quality and Certifications

Every process step is based on advanced methods within a continuous improvement process; the final quality control takes place in the cleanroom. The quality management system meets the requirements of the standards ISO 9001, ISO 50001, ISO 14001 and ISO 45001.

EvidenceNuremberg
ISO 9001
ISO 14001
ISO 45001
ISO 50001

History

  1. unbekannt

    No documented historical events from the sources

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