Optimization, scaling and production of custom polymers for semiconductor and electronics chemistry.
Supurior GmbH
Ober-Ramstadt (Headquarters)New on Amplifa
About Supurior
Supurior GmbH, based in Ober-Ramstadt, specializes in the development, optimization, scaling and production of custom polymers. Based on a licensed polymerization technology from Fraunhofer LBF, copolymers and block copolymers are synthesized from up to five different monomers in order to specifically tune properties such as solubility, reactivity, adhesion, chemical resistance and thermal stability. Typical monomer bases are methacrylates as well as styrene, hydroxystyrene and its derivatives; further monomers are available on request. The focus is on a narrow molecular weight distribution (low PDI), fully suppressed oligomer formation, and highest purity with minimal residual monomer, oligomer, particle and metal ion content according to semiconductor quality standards. Supurior scales from the first gram to commercial quantities in the kilogram range and performs industrial production including quality control and purification. The company's provenance from 15 years of experience in the electronic chemicals industry makes it a suitable partner for photoresist applications.
- Site
- Ober-Ramstadt
- Processes
- Polymerization (copolymer/block copolymer synthesis of up to five monomers, scale-up from grams to, Optimization and scaling of custom polymers (gram to kilogram range), Development of custom polymer solutions, Commercial production with quality control, Cleaning/purification of polymers
- Materials
- Methacrylates, Styrene, Hydroxystyrene and derivatives
- Industries
- Semiconductor/electronics chemistry, Photoresist applications
- 01
Development of custom polymer solutions
- 02
Optimization and scaling from the first gram to several kilograms
- 03
Purification of the polymers
- 04
Commercial production
- 05
Quality control
Monomer & Polymer Technology
Methacrylates
Typical monomer class used to tune the solubility, reactivity, adhesion, chemical resistance and thermal stability of the polymers.
Styrene
Monomer base for polymers with specifically tailored properties, among others for photoresist applications.
Hydroxystyrene and derivatives
Used for polymers that meet the requirements of the semiconductor and photoresist industry.
Location
Ober-Ramstadt
DEHeadquarters
- Part weight / size
- first grams to commercial production quantities
- Lot size
- gram to kilogram range
- Materials
- Methacrylates, styrene, hydroxystyrene and derivatives
- Polymerization (Fraunhofer LBF technology)
- Purification
- Quality control
Products
Inside the production
Industries
Processes & technical limits
| Processes | Tolerance | Max. part | Weight | Lot size | Materials |
|---|---|---|---|---|---|
| Polymerization (copolymer/block copolymer synthesis of up to five monomers, scale-up from grams toPlastics | – | – | first grams – several kilograms to commercial | – | Polymers based on methacrylates, Polymers based on styrene, hydroxystyrene and derivatives |
Additional services