Development and manufacture of ultrasonic and megasonic cleaning systems in the frequency range 400 kHz to 9 MHz
Sonosys GmbH
Neuenbürg, GermanyNew on Amplifa
About Sonosys
Sonosys GmbH, based in Neuenbürg (Baden-Württemberg), develops, manufactures and markets ultrasonic and megasonic cleaning systems for cleaning micro- and nanostructures. The company masters the production of high-frequency ultrasonic systems in the range from 400 kHz to 9 MHz and offers megasonic generators, transducers and nozzle systems in single, dual and triple versions. The solutions remove the smallest particles and contamination down into the nanometer range from wafers, photomasks and substrates and are integrated as single and batch applications in wet cleaning equipment. Its main markets are the semiconductor industry, microsystems technology/MEMS, optics, solar/PV, as well as ligation technology and the food industry. In addition to standard products, SONOSYS develops customer-specific solutions in terms of frequency, modulation, dimensions and power; demo systems can be rented for tests at the customer's site. In 2022, the company was recognized by Semiconductorreview.com as one of Germany's Top 5 semiconductor companies.
- Site
- Neuenbürg
- Processes
- Megasonic cleaning (cleaning of micro- and nanostructures), Ultrasonic cleaning, Demo systems available for rent for tests at the customer's site, Development of customized solutions (frequency, modulation, dimensions, power), Connection/integration into wet cleaning equipment
- Materials
- Megasonic cleaning, Ultrasonic cleaning, Megasonic nozzles (single/dual/triple)
- Founded
- 1995
- Industries
- Semiconductors (wafer/photomask cleaning), Microsystems technology/MEMS, Optics, Solar/PV, Ligation technology, Food industry
- 01
Development of customized cleaning solutions
- 02
Manufacture of megasonic generators and transducers
- 03
Integration into wet cleaning equipment
- 04
Testing via rentable demo systems at the customer's site
- 05
Worldwide sales and support
Technologies & Processes
Megasonic cleaning
Cleaning of micro- and nanostructures on wafers, photomasks and substrates down into the nanometer range.
Ultrasonic cleaning
High-frequency cleaning of wafers and substrates in the frequency range 400 kHz to 5 MHz.
Megasonic nozzles (single/dual/triple)
Nozzle systems for particle removal in various size ranges with minimal pattern damage.
Site
Neuenbürg
DEHeadquarters, development and production
- Materials
- Wafers, photomasks, substrates
- Megasonic generators and transducers (400 kHz to 9 MHz)
- Ultrasonic and megasonic cleaning systems (400 kHz to 5 MHz)
- Megasonic nozzle systems (single, dual, triple)
Industries
Processes & technical limits
| Processes | Tolerance | Max. part | Weight | Lot size | Materials |
|---|---|---|---|---|---|
| Megasonic cleaning (cleaning of micro- and nanostructures)Surface | – | – | – | – | Wafer, Photomasks, Substrates |
| Ultrasonic cleaningSurface | – | – | – | – | Wafer, Substrates |
3 Anlagen & Maschinen
| Machine | Manufacturer / model | Quantity | Working area | Year built | Site |
|---|---|---|---|---|---|
| Megasonic generators and transducers | SONOSYS | – | Frequency range 400 kHz to 9 MHz | – | Neuenbürg, Germany |
| Megasonic nozzle systems (single, dual, triple) | SONOSYS | – | – | – | – |
| Ultrasonic and megasonic cleaning systems | SONOSYS | – | Frequency range 400 kHz to 5 MHz | – | Neuenbürg, Germany |
Additional services
Reference customers
History
- 1995
Founding of Sonosys GmbH
- 2022
Named one of the 'Top 5 Semiconductor Companies' in Germany by Semiconductorreview.com